APOL-LO Hi-Res Negative Lift-Off

APOL-LO 3200 Series Resist is a negative tone Advanced Photoresist with Lift-Off profile for i-line and broadband applications.

  • Improved resolution                                 

  • Wider process window

  • Film Thickness range of  2 – 10+ μm

  • Designed for use with industry standard developers

Customization available to:

  • Adjust Lift-Off Angle

  • Adjust PhotoSpeed

 
 
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