APOL-LO Hi-Res Negative Lift-Off
APOL-LO 3200 Series Resist is a negative tone Advanced Photoresist with Lift-Off profile for i-line and broadband applications.
Wider process window
Film Thickness range of 2 – 10+ μm
Designed for use with industry standard developers
Customization available to:
Adjust Lift-Off Angle