HARE-SQ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. It works well for permanent applications because of excellent chemical and mechanical resistance. It is photosensitive to NUV, i-line and broadband wavelength.

  • Film thickness: 2 to 100+ microns

  • Superior cleanliness

  • Excellent reproducibility

  • Cost effective: SQ delivers quality at a budget friendly price

  • Fully compatible with SU-8 processes

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