KL P4800 Thick Positive Photoresist

KL P4800 is a thick postivive photoresist for use in i-Line, g-Line and broadband packaging applications.

It offers high sensitivity, high throughput, and excellent process latitude.

  • Cover 10 – 25 µm in a single coat
  • Designed for use with metal-ion or metal-ion free developers
  • No PEB required
25 um film, 10 um S/L

25 um film, 10 um S/L

15 um film, 7 um S/L

15 um film, 7 um S/L

Copper Plating Application: 5 um Cu Posts

Copper Plating Application: 5 um Cu Posts