KL P4800 Thick Positive Photoresist
KL P4800 is a thick postivive photoresist for use in i-Line, g-Line and broadband packaging applications.
It offers high sensitivity, high throughput, and excellent process latitude.
- Cover 10 – 25 µm in a single coat
- Designed for use with metal-ion or metal-ion free developers
- No PEB required