Meet at SPIE 2018.jpg

Meet KemLab at SPIE Advanced Lithography on Feb 25-Mar 1, 2018 at San Jose, CA.

Contact us for appointment.

Meet KemLab at Semicon China on Mar 14-16, 2018 at Shanghai.

Contact us for appointment.

KL4800 News.jpg

New release for positive thick packaging resist KL P4800. It covers film thickness up to 40 um and designs for bumping and plating applications.

High aspect ratio epoxy resist HARE SQ is available now. It is a negative resist designed for MEMS, microfludics and other applications.