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PFAS-Free Fluorine-Free
KemLab KL7000 Series
KL7000 Series are positive photoresists for use in i-line, g-line and broadband applications. They offer high sensitivity, high resolution and wide process latitude. The KL7000 system is engineered to contain no PFAS and no Fluorine containing materials for environmental safety and demanding regulatory compliance.
• Single coat coverage 0.15 – 3.0 µm
• Designed for use with industry standard MIF and MIB developers; optimized for 0.26N TMAH
• Achieve resolution 0.55 µm dense line/space and 0.40 µm isolated line
FEATURES
Tone: Positive
Film Thickness: 0.15 – 3.0 µm
Sensitivity: NUV, Broadband, i-line, h-line, g-line
Developer: TMAH-based
Remover: NMP, DMSO at 50–80°C
Products: KL7002-TF, KL7005, KL7010, KL7015, KL7020
Data Sheet
Photoresists & Ancillaries
Ancillaries
80/20 Spin-On Primer
EdgeClean - Edge Bead Remover
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Positive Tone Photoresists
✓ SHORT LEAD TIMES ✓ COMPETITIVE PRICING ✓ ISO 9001:2015 CERTIFIED
KemLab Inc. is a US-based photoresist manufacturing facility and photolithography research and innovation company. The world headquarters and production facilities are located in Woburn, Massachusetts, USA. KemLab Inc. is focused on high-tech photosensitive imaging materials used in the electronics industry, providing high quality and cost-competitive products to both North American and overseas markets.
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