Description

APOL-LO 3200 Series resist is a negative tone advanced photoresist with a lift-off profile for i-Line and broadband applications.

• Improved resolution

• Wider process latitude

• Film Thickness range of  2 – 10+ μm

• Designed for use with industry standard developers

• Customization available to:

  • Adjust Lift-Off Angle

  • Adjust PhotoSpeed

• Competes with AZ® nLOF™ 2020, AZ® nLOF™ 2035, AZ® nLOF™ 2070

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Volumes & Customization

Sizes available: 100ml sample, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request

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