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KL 5300
General Purpose
Description
KL5300 series are positive photoresists for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude.
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Cover 0.25 – 2.5 µm in a single coat
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Designed for use with industry standard TMAH 0.26N developers
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Achieve resolution 0.55 µm
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Competes with S1805™, S1808™, S1811™, S1813™, S1818™
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Volumes & Customization
Sizes available: 100ml sample, 500ml, 1L, 4L
Production volumes available
Custom thicknesses and formulations are available by request
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