Description

K-PRO™ photoresists are advanced packaging positive resists for use in i-line, g-line and broadband packaging applications. They are compatible with plating metals including copper, pure tin, and nickel and offer high sensitivity, high throughput, and excellent process latitude. K-PRO™ positive-tone photoresists are designed to cover varied terrain for advanced wafer level packaging, MEMS, and 3D photolithography applications. 

• Cover 5 – 25 µm in a single coat

• Double-coat process available for up to 50 microns

• Designed for use with metal-ion or metal-ion free developers

• No PEB required

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Volumes & Customization

Sizes available: 100ml sample, 500ml, 1L, 4L

Production volumes available

Custom thicknesses and formulations are available by request