HARP PMMA and Copolymer
e-Beam Resists
™
HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.
​
Applications
• e-Beam direct write lithography
• Multi-layer T-gate manufacture
• X-Ray LIGA
• Protective Coating for wafer thinning
Safe Solvent
KemLab HARP™ PMMA products are manufactured in safe solvents (anisole and ethyl lactate)
​
Volumes & Customization
Resist sizes available: 100ml, 500ml, 1L, 4L
Developer sizes available: 4L
Custom dilutions are available upon request
​
Comparison of high resolution e-Beam resists
1000 HARP 100nm, 600uC, lines
Product | Approximate FT (microns) at 2000 rpm | Competitive Product |
|---|---|---|
1000 HARP eB 0.1 | 0.1 | 950 PMMA A2 |
1000 HARP eB 0.2 | 0.2 | 950 PMMA A3 |
1000 HARP eB 0.3 | 0.3 | 950 PMMA A4 |
1000 HARP eB 0.4 | 0.4 | 950 PMMA A5 |
1000 HARP eB 0.7 | 0.7 | 950 PMMA A6 |
1000 HARP eB 1.3 | 1.3 | 950 PMMA A8 |
1000 HARP eB 1.7 | 1.7 | 950 PMMA A9 |
1000 HARP eB 2.7 | 2.7 | 950 PMMA A11 |
500 HARP eB 0.07 | 0.07 | 495 PMMA A2 |
500 HARP eB 0.15 | 0.15 | 495 PMMA A3 |
500 HARP eB 0.2 | 0.2 | 495 PMMA A4 |
500 HARP eB 0.3 | 0.3 | 495 PMMA A5 |
500 HARP eB 0.4 | 0.4 | 495 PMMA A6 |
500 HARP eB 0.7 | 0.7 | 495 PMMA A8 |
500 HARP eB 1.5 | 1.5 | 495 PMMA A11 |
HARP-C 0.2 | 0.2 | 8.5 MAA EL 6 |
HARP-C 0.4 | 0.4 | 8.5 MAA EL 9 |
HARP-C 0.5 | 0.5 | 8.5 MAA EL 10 |
HARP-C 0.7 | 0.7 | 8.5 MAA EL 11 |
HARP-C 0.8 | 0.8 | 8.5 MAA EL 12 |
PMMA e-Beam Resists
1000 HARP eB
-
Highest molecular weight (Mw) PMMA polymer
-
Best resolution and contrast PMMA
-
Manufactured in Anisole
-
Competes with 950 PMMA
500 HARP eB
-
PMMA Polymer with mid-range Mw
-
Faster throughput versus 1000 HARP eB
-
Manufactured in Anisole
-
Competes with 495 PMMA
HARP-C
-
MMA/MAA (methyl methacrylate/methacrylic acid) copolymer
-
Used in multi-layer process with PMMA
-
Manufactured in Ethyl Lactate
-
Competes with MMA(8.5)MAA
HARP Developer
-
HARP PMMA Developer
-
MIBK / IPA 1:1
-
High resolution / Fast develop
-
-
MIBK / IPA 1:3
-
Highest resolution / Slow develop
-
1000 HARP 100nm, 600uC
1000 HARP 40nm, 600uC
1000 HARP 100nm, 600uC