KL5300 General Purpose Positive Photoresist

Tone: Positive

Film Thickness: 0.5 - 2.0 microns

Applications: IC fabrication

KL5300 series are positive photoresists for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude. They are designed for use with industry standard 0.26 N TMAH developers. Resolution of 0.55 µm can be achieved.

Cover 0 – 2.5 µm in a single coat
Designed for use with industry standard TMAH 0.26N developers
Achieve resolution 0.55 µm
Competes with S1805™, S1808™, S1811™, S1813™, S1818™

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KL5300 General Purpose Positive Photoresist

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