DESCRIPTION
KL7000 Series are positive photoresists for use in i-line, g-line and broadband applications. They offer high sensitivity, high resolution and wide process latitude. The KL7000 system is engineered to contain no PFAS and no Fluorine containing materials for environmental safety and demanding regulatory compliance.  
 
Single coat coverage 0.15 – 3.0 µm
Designed for use with industry standard MIF and MIB developers; optimized for 0.26N TMAH
Achieve resolution 0.55 µm dense line/space and 0.40 µm isolated line
Competes with S1800™, AZ®1500, and other general use positive tone photoresist
 
​FEATURES
Tone:                         Positive
Film Thickness:    0.15 – 3.0 µm
Sensitivity:             NUV, Broadband, i-line, h-line, g-line
Developer:              TMAH-based
Remover:                 NMP, DMSO at 50–80°C
 
LINK TO DATA SHEET