SQ Series
SU-8 Epoxy Photoresists
KemLab SU-8 epoxy photoresists utilize a high-purity epoxy resin tailored for microelectronics, offering enhanced cleanliness and outstanding lithographic consistency from batch to batch, surpassing that of legacy SU-8 products. The SQ Series is a negative tone photoepoxy formulated specifically for polymeric MEMS, microfluidics, micromining, and various permanent microelectronic applications. SQ resists are responsive to NUV, i-line, and broadband wavelengths, with film thicknesses ranging from 2 to 200 microns.
Suitable for permanent applications such as MEMS, micro arrays, VCSEL, waveguides, antennas, sensors, microfluidics, PDMS molding, pixel walls, fluidic channels, inkjet nozz, and spacers.
SQ Series
The SQ Series is a negative photoresist based on SU-8 epoxy, specifically designed polymeric MEMS, microfluidics, micromachining, and microelectronics. It is optimized for thick film applications ranging from 2 to 100 microns. SU-8 epoxy photoresists produce robust images with excellent and thermal stability, essential for thick applications. The SQ Series features vertical sidewalls in thick films, making it ideal for permanent applications.
SQ QuickDry Series
SQ QuickDry is an epoxy-based negative photoresist tailored for polymeric MEMS, microfluidics, micromachining, and various microelectronic applications. This system is optimized for both thin and thick film up to 200 microns and features a quicker drying solvent system that minimizes processing times, resulting in enhanced throughput.​​​​​​​​
SQ MicroCoat Series
SQ MicroCoat resists are epoxy-based negative photoresists designed for thin films, high temperatures and severe chemical applications. SQ MicroCoat is designed for use in thin films ranging from 0.05 - 2.0 µm and are often used in permanent device applications. Ultra-thin coatings of 50 nm fully cross-linked are achievable and used for imaged surface protection.
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SQ OptiCoat Series
SQ OptiCoat is an advanced epoxy-based negative photoresist for permanent devices with demanding optical parameters such as waveguides and sensors. SQ OptiCoat is an improved version of SQ. Using patent-pending advanced chemistry, higher transparency can be maintained over a wide temperature range. Film thicknesses of 2 to 100 microns can be achieved with a single spin coat.
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5 reasons
TO SWITCH TO SQ SERIES SU-8 PHOTOEPOXY
Lower Pricing
SQ is designed to be competitive in the market with prices that beat the competition. Better quality for less cost. Contact KemLab or our distributors for more information and pricing.
Superior Raw Materials
SQ Series SU-8 epoxy resist uses a superior quality resin specially designed for the microelectronics industry. This superior resin manufacturing process produces a cleaner, more consistent negative epoxy photoresist with fewer particles, more transparency, and fewer microbubbles.
Plug-n-Play
SQ resists are fully compatible with established SU-8 lithographic processes. Pull out SU-8 negative epoxy and plug in KemLab SQ.
Application-Focused Quality Control
Value-added testing was identified and implemented to benefit specific microfluidic and optical industry requirements.
Better Optical Transparency
SQ Series SU-8 resin material is visually cleaner, less yellow and more transparent resulting in improved transmission and resistance to oxidative yellowing versus legacy SU-8 products.